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Granularity Aspect of the High Temperature Superconductivity (Htsc) Materials Made by Metal Organic Chemical Vapour Deposition Method

dc.authorscopusid 56186362100
dc.authorscopusid 7004114723
dc.authorscopusid 6504525411
dc.authorscopusid 6508328151
dc.authorwosid Demi̇rel, Ali/Aak-5802-2021
dc.contributor.author Demirel, AI
dc.contributor.author Yilmaz, R
dc.contributor.author Lu, AAG
dc.contributor.author Zahrir, AD
dc.date.accessioned 2025-05-10T17:45:54Z
dc.date.available 2025-05-10T17:45:54Z
dc.date.issued 2000
dc.department T.C. Van Yüzüncü Yıl Üniversitesi en_US
dc.department-temp Yuzuncu Yil Univ, Fac Sci & Art, TR-65080 Van, Turkey en_US
dc.description.abstract Superconducting YBCO thin films grown by a MOCVD technique have been studied. Granular structure appearance of the high temperature superconducting materials and exponential behaviour of their resistance near the zero resistance region were investigated. Power law fitting for. resistance versus temperature plot was obtained as R=1.6 x 10(-19)T(7.91). Twin boundaries, due to accommodation to the structural symmetry as the a and b axis are differentiated by oxygen uptake are a soul-cc of. a further weak-link picture. The scale range for. a twin boundary is commonly measured to be close to 1000 Angstrom. en_US
dc.description.woscitationindex Science Citation Index Expanded
dc.identifier.endpage 820 en_US
dc.identifier.issn 0019-5596
dc.identifier.issue 12 en_US
dc.identifier.scopus 2-s2.0-0034346091
dc.identifier.scopusquality Q3
dc.identifier.startpage 815 en_US
dc.identifier.uri https://hdl.handle.net/20.500.14720/16495
dc.identifier.volume 38 en_US
dc.identifier.wos WOS:000166933000005
dc.identifier.wosquality Q4
dc.language.iso en en_US
dc.publisher Natl inst Science Communication en_US
dc.relation.publicationcategory Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı en_US
dc.rights info:eu-repo/semantics/closedAccess en_US
dc.title Granularity Aspect of the High Temperature Superconductivity (Htsc) Materials Made by Metal Organic Chemical Vapour Deposition Method en_US
dc.type Article en_US

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