The Schottky Barrier Height of the Rectifying Cu/Pyronline-b Au/Pyronine-b Sn/Pyronine-b and Al/Pyronine-b Contacts
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Date
2004
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Elsevier Science Sa
Abstract
The Cu/pyronine-B/p-Si, Au/pyronine-B/p-Si, Al/pyronine-B/p-Si and Sn/pyronine-B/p-Si Schottky structures have been obtained by sublimation of the organic compound pyronine-B onto the top of p-Si surface. Our goal is to experimentally investigate whether or not a nonpolymeric organic compound as contact to an inorganic semiconductor such as Si can provide the continuous control of the barrier height (BH). The barrier height Phi(bp) values of 0.51, 0.674, 0.75 and 0.79 eV for the Cu/pyronine-B/p-Si, Au/pyronine-B/p-Si, Al/pyronine-B/P-Si and Sn/pyronine-B/p-Si Schottky structures have obtained from the forward current-voltage (I-V) characteristics. It has been seen that the values of Phi(bp) are significantly larger than those of conventional Schottky diodes. (C) 2003 Elsevier B.V. All rights reserved.
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Keywords
Schottky Barrier, Metal-Interfacial Layer-Semiconductor Contacts, Organic-Inorganic Semiconductor Contact, Pyronine-B
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Q2
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Q1
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Volume
142
Issue
1-3
Start Page
177
End Page
180