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The Schottky Barrier Height of the Rectifying Cu/Pyronline-b Au/Pyronine-b Sn/Pyronine-b and Al/Pyronine-b Contacts

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Date

2004

Journal Title

Journal ISSN

Volume Title

Publisher

Elsevier Science Sa

Abstract

The Cu/pyronine-B/p-Si, Au/pyronine-B/p-Si, Al/pyronine-B/p-Si and Sn/pyronine-B/p-Si Schottky structures have been obtained by sublimation of the organic compound pyronine-B onto the top of p-Si surface. Our goal is to experimentally investigate whether or not a nonpolymeric organic compound as contact to an inorganic semiconductor such as Si can provide the continuous control of the barrier height (BH). The barrier height Phi(bp) values of 0.51, 0.674, 0.75 and 0.79 eV for the Cu/pyronine-B/p-Si, Au/pyronine-B/p-Si, Al/pyronine-B/P-Si and Sn/pyronine-B/p-Si Schottky structures have obtained from the forward current-voltage (I-V) characteristics. It has been seen that the values of Phi(bp) are significantly larger than those of conventional Schottky diodes. (C) 2003 Elsevier B.V. All rights reserved.

Description

Keywords

Schottky Barrier, Metal-Interfacial Layer-Semiconductor Contacts, Organic-Inorganic Semiconductor Contact, Pyronine-B

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WoS Q

Q2

Scopus Q

Q1

Source

Volume

142

Issue

1-3

Start Page

177

End Page

180